Ting Fang

Title: Innovations by Inventor Ting Fang

Introduction

Ting Fang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of six patents. His work focuses on advanced methods and structures that enhance the performance and efficiency of semiconductor devices.

Latest Patents

Ting Fang's latest patents include innovative methods for source/drain contact structures. One patent describes a method that involves receiving a workpiece with a gate structure and various dielectric features. This method includes replacing a portion of the dielectric layer with a hard mask layer and etching to form a source/drain contact opening. Another patent details a semiconductor device featuring a fin structure with a source/drain region and a gate structure. This design includes a source/drain contact with a protruding segment that electrically couples the source/drain region and the gate structure.

Career Highlights

Ting Fang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has been instrumental in developing cutting-edge technologies that drive advancements in semiconductor manufacturing.

Collaborations

Ting Fang collaborates with esteemed colleagues, including Fu-Kai Yang and Chen-Ming Lee, who contribute to the innovative projects at their company.

Conclusion

Ting Fang's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the development of advanced semiconductor devices.