Company Filing History:
Years Active: 2024-2025
Title: Thomas Schmitt: Innovator in CVD Reactor Technology
Introduction
Thomas Schmitt is a notable inventor based in Mönchengladbach, Germany. He has made significant contributions to the field of chemical vapor deposition (CVD) technology. With a total of 2 patents, his work focuses on improving the efficiency and accuracy of CVD processes.
Latest Patents
One of Thomas Schmitt's latest patents is a method for recording a state of a CVD reactor under production conditions. This innovative process involves setting a process temperature and pressure while feeding a process gas flow into the reactor's process chamber. Sensors are utilized to gather measurement data, which is then used to calculate a current fingerprint that is compared with a historic fingerprint. This method enhances the monitoring and control of the CVD process, ensuring optimal conditions for substrate treatment.
Another significant patent is related to a CVD device component provided with an individual identifier. This invention allows for the communication of information to a process control device by heating a component with structured volumetric regions. The structures radiate in the infrared spectrum, enabling them to be distinguished by an infrared sensor. This machine-readable identifier serves as an originality identification means for the component, allowing for better thermal treatment of substrates.
Career Highlights
Thomas Schmitt is currently employed at Aixtron SE, a leading company in the field of CVD technology. His work at Aixtron has positioned him as a key player in advancing CVD processes and technologies.
Collaborations
Throughout his career, Thomas has collaborated with notable colleagues, including Matthias Johannes Bode and Micha Cornel Franke. These collaborations have contributed to the development of innovative solutions in the CVD sector.
Conclusion
Thomas Schmitt's contributions to CVD technology through his patents and work at Aixtron SE highlight his role as an influential inventor in the field. His innovative methods and collaborative efforts continue to shape advancements in chemical vapor deposition processes.