Aixtron Se

Thomas Schmitt

Oliver Schön

Peter Sebald Lauffer

Micha Cornel Franke

Markus Mohnen

Pascal Tillmanns

Matthias Johannes Bode

During a process involving one or more process steps of a process phase, in which a substrate is located in the process chamber of a CVD reactor, a process temperature and a pressure are each set and a process gas flow is fed into the process chamber by way of control data delivered by a controller in accordance with a formula stored in the controller. Additionally, sensors are used to determine measurement data from which a current fingerprint is calculated and then compared with a historic fingerprint. The fingerprint includes only values or groups of values that are obtained from measured values that are recorded during one or more conditioning steps of a conditioning phase in which a conditioning temperature and a conditioning pressure are each set and a conditioning gas flow is fed into the process chamber in accordance with control data specified by the formula.

Method for recording a state of a CVD reactor under production conditions

Information is communicated to a process control device by performing a process that includes the step of heating a component, the component having structured volumetric regions. When the component is heated, structures present in the volumetric regions radiate in the infrared spectrum, allowing the structures to be distinguished by an infrared sensor. The structures, formed by elevations or depressions, form a machine-readable identifier, which can be used as an originality identification means for the component. Since the identifier can be determined in situ during a heating process, the process control device can recognize whether correction values are to be used for the thermal treatment of a substrate.

CVD device component provided with an individual identifier, and method for communicating information

Growing community of inventors

Mönchengladbach, Germany

Thomas Schmitt