Thomas Hua-Min Williams

Title: Innovations of Thomas Hua-Min Williams

Introduction

Thomas Hua-Min Williams is a prominent inventor based in Irvine, California. He has made significant contributions to the field of integrated circuits, holding a total of 4 patents. His work focuses on optimizing metal interconnect spacing to enhance performance in electronic devices.

Latest Patents

Williams' latest patents include innovative designs for integrated circuits (ICs) that employ multi-pattern metallization. One notable patent describes an IC that features transistors with source and drain connections designed to reduce resistance. By extending one of the metal lines connected to the source or drain, he has created additional via landing areas that minimize connection resistance without increasing capacitance. Another patent involves packed terminal transistors, which utilize fins and gate structures to improve the efficiency of source and drain contact layers.

Career Highlights

Williams is currently employed at Qualcomm Incorporated, a leading company in the telecommunications industry. His work at Qualcomm has allowed him to push the boundaries of integrated circuit technology, contributing to advancements that benefit a wide range of electronic applications.

Collaborations

Throughout his career, Williams has collaborated with talented individuals such as Bed Raj Kandel and Katherine Zhang. These partnerships have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Thomas Hua-Min Williams is a distinguished inventor whose work in integrated circuits has led to significant advancements in the field. His innovative patents and contributions at Qualcomm Incorporated highlight his commitment to improving electronic performance.