Troy, MO, United States of America

Thomas E Doane


 

Average Co-Inventor Count = 7.3

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 2008-2016

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5 patents (USPTO):Explore Patents

Title: Innovations of Thomas E. Doane

Introduction

Thomas E. Doane is a notable inventor based in Troy, Missouri, who has made significant contributions to the field of semiconductor and solar material manufacturing. With a total of five patents to his name, Doane's work focuses on innovative methods that enhance the production processes in these industries.

Latest Patents

One of Doane's latest patents is titled "Methods for Producing Rectangular Seeds for Ingot Growth." This method involves connecting an adhesive layer to a template that features a plurality of parallel slots. The process includes drawing alignment lines on the adhesive layer, which are aligned with some of the parallel slots. Additionally, the method connects quarter sections to the adhesive layer, ensuring that the interface between a rectangular seed portion and a curved wing portion of each quarter section aligns with at least one of the drawn alignment lines. Finally, the quarter sections are sliced to separate the rectangular seed portions from the curved wing portions.

Career Highlights

Throughout his career, Thomas E. Doane has worked with prominent companies in the semiconductor industry, including MEMC Electronic Materials, Inc. and MEMC Singapore Pte. Ltd. His experience in these organizations has allowed him to develop and refine his innovative techniques in material manufacturing.

Collaborations

Doane has collaborated with several professionals in his field, including Henry Frank Erk and Guoqiang (David) Zhang. These collaborations have contributed to the advancement of his research and the successful implementation of his patented methods.

Conclusion

Thomas E. Doane's contributions to the field of semiconductor and solar material manufacturing through his innovative patents demonstrate his commitment to advancing technology. His work continues to influence the industry and pave the way for future developments.

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