Thomas A Estelle

Title: Innovations of Thomas A. Estelle

Introduction

Thomas A. Estelle is a notable inventor based in Northborough, MA, with a focus on advancements in photolithography. He holds two patents that contribute significantly to the field of semiconductor manufacturing. His work is characterized by innovative processes that enhance lithographic techniques.

Latest Patents

Estelle's latest patents include "Processes for Photolithography" and "Photoresist Pattern Trimming Compositions and Methods." The first patent outlines new lithographic processing methods particularly useful in immersion lithography schemes. This process involves applying a photoresist composition on a substrate, exposing it to radiation, and developing the treated photoresist layer to create a relief image. The second patent provides compositions and methods for trimming a photoresist pattern, which includes a matrix polymer and an aromatic acid, finding particular applicability in semiconductor device manufacturing.

Career Highlights

Estelle is currently associated with Rohm & Haas Electronic Materials LLC, where he applies his expertise in photolithography. His contributions to the field have been recognized through his patents, which reflect his commitment to innovation in semiconductor technology.

Collaborations

Some of his notable coworkers include Cong Liu and Seung-Hyun Lee, who have collaborated with him on various projects within the company.

Conclusion

Thomas A. Estelle's work in photolithography represents a significant advancement in semiconductor manufacturing processes. His patents demonstrate his innovative approach and dedication to improving lithographic techniques.