Tejinder Singh

Title: Tejinder Singh: Innovator in Semiconductor Processing

Introduction

Tejinder Singh is a prominent inventor based in San Jose, CA, known for his significant contributions to semiconductor processing. With a total of 11 patents to his name, Singh has made remarkable advancements in the field, particularly in methods that enhance the efficiency and effectiveness of semiconductor manufacturing.

Latest Patents

Singh's latest patents include a method for forming and patterning a layer and/or substrate. This innovative method involves creating a first and second mandrel on a substrate, followed by the formation of spacers along their sidewalls. A gap is defined between these spacers, which is then filled with a gap-filling material, often comprising doped silicon. Another notable patent addresses dose reduction of patterned metal oxide photoresists. This patent outlines a multilayer stack used as a mask in extreme ultraviolet (EUV) lithography, detailing a process that improves adhesion and reduces EUV dose energies.

Career Highlights

Throughout his career, Tejinder Singh has worked with leading companies in the technology sector, including Applied Materials, Inc. and Cavium, Inc. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking innovations in semiconductor technology.

Collaborations

Singh has collaborated with notable professionals in his field, including Abhijit Basu Mallick and Ho-yung David Hwang. These collaborations have further enriched his work and expanded the impact of his inventions.

Conclusion

Tejinder Singh's contributions to semiconductor processing through his innovative patents and collaborations highlight his role as a key figure in the field. His work continues to influence advancements in technology and manufacturing processes.