The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 02, 2021

Filed:

Jul. 31, 2019
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Tejinder Singh, San Jose, CA (US);

Takehito Koshizawa, San Jose, CA (US);

Abhijit Basu Mallick, Palo Alto, CA (US);

Pramit Manna, Sunnyvale, CA (US);

Nancy Fung, Livermore, CA (US);

Eswaranand Venkatasubramanian, Santa Clara, CA (US);

Ho-yung David Hwang, Cupertino, CA (US);

Samuel E. Gottheim, Santa Clara, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/10 (2006.01); H01L 21/02 (2006.01); H01L 27/108 (2006.01);
U.S. Cl.
CPC ...
H01L 27/10844 (2013.01);
Abstract

Apparatuses and methods to provide a patterned substrate are described. A plurality of patterned and spaced first lines and carbon material lines and formed on the substrate surface by selectively depositing and etching films extending in a first direction and films extending in a second direction that crosses the first direction to pattern the underlying structures.


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