Tamotsu Maruyama

Title: The Innovations of Tamotsu Maruyama

Introduction

Tamotsu Maruyama is a prominent inventor based in Nakakubiki-gun, Japan. He has made significant contributions to the field of photomask technology, holding a total of 10 patents. His work has been instrumental in advancing the capabilities of photomasks used in semiconductor manufacturing.

Latest Patents

One of his latest patents is related to a photomask blank and fabrication method. This innovation involves a light-shielding film formed on a transparent substrate made of quartz, which serves as a photomask substrate. The light-shielding film functions as both a light-shielding and anti-reflection film. It has a total thickness of 100 nm or less, with 70% or more of this thickness attributed to a chromium compound that has a specific optical density for light at a wavelength of 450 nm. Another notable patent is for a phase-shift photomask blank and fabrication method. This invention features a phase-shift multilayer film on a substrate that is transparent to exposure light. The film includes a stack of two layers of a metal silicide compound, enhancing the chemical stability and resistance of the photomask.

Career Highlights

Throughout his career, Tamotsu Maruyama has worked with leading companies in the industry, including Shin-Etsu Chemical Co., Ltd. and Toppan Printing Co., Ltd. His expertise in photomask technology has made him a valuable asset in these organizations.

Collaborations

He has collaborated with notable coworkers such as Satoshi Okazaki and Yukio Inazuki, contributing to various projects that have pushed the boundaries of photomask technology.

Conclusion

Tamotsu Maruyama's innovations in photomask technology have significantly impacted the semiconductor industry. His patents reflect a deep understanding of materials and their applications, ensuring that his contributions will be felt for years to come.