The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2003
Filed:
Jan. 11, 2001
Applicant:
Inventors:
Yukio Inazuki, Nakakubiki-gun, JP;
Hideo Kaneko, Nakakubiki-gun, JP;
Tamotsu Maruyama, Nakakubiki-gun, JP;
Satoshi Okazaki, Nakakubiki-gun, JP;
Assignee:
Shin-Etsu Chemical Co., Ltd., , JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 ; B32B 1/504 ;
U.S. Cl.
CPC ...
G03F 9/00 ; B32B 1/504 ;
Abstract
A phase shift mask blank has a phase shift film of MoSiOC or MoSiONC on a transparent substrate, and optionally a chromium-based light-shielding film, a chromium-based antireflection film or a multilayer combination of both on the phase shift film. A manufacture method involving depositing the MoSi base phase shift film by a reactive sputtering technique using a sputtering gas containing carbon dioxide produces a phase shift mask blank and phase shift mask of quality, with advantages of in-plane uniformity and easy control during manufacture.