The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2009
Filed:
May. 11, 2006
Yukio Inazuki, Niigata, JP;
Hiroki Yoshikawa, Niigata, JP;
Tamotsu Maruyama, Niigata, JP;
Satoshi Okazaki, Niigata, JP;
Yukio Inazuki, Niigata, JP;
Hiroki Yoshikawa, Niigata, JP;
Tamotsu Maruyama, Niigata, JP;
Satoshi Okazaki, Niigata, JP;
Shin-Etsu Chemical Co., Ltd, Tokyo, JP;
Abstract
On a substrate that is transparent to exposure light, a phase-shift multilayer film including a stack of two layers of a metal silicide compound is formed. A stabilized oxide layer is formed on the surface of the metal silicide compound layer close to the top surface. The layer close to the substrate (the lower layer) of the phase-shift multilayer film is made of a relatively-metal-rich metal silicide compound, and the upper layer is made of a relatively-metal-poor metal silicide compound. The stabilized oxide layer has a metal-poor composition, and the metal content thereof is equal to or less than one third of the metal content of the lower layer. Thus, the stabilized oxide layer is highly chemically stable and has a high chemical resistance.