The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 2003
Filed:
Jan. 04, 2001
Satoshi Okazaki, Nakakubiki-gun, JP;
Ichiro Kaneko, Nakakubiki-gun, JP;
Jiro Moriya, Nakakubiki-gun, JP;
Masayuki Suzuki, Nakakubiki-gun, JP;
Tamotsu Maruyama, Nakakubiki-gun, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
A phase shift mask blank comprising a transparent substrate and at least one layer of a phase shifter thereon, wherein the phase shifter is a film composed primarily of a fluorine-doped metal silicide, can be fabricated into a high-performance phase shift mask having adequate transmittance and good stability over time even when used with light sources that emit short-wavelength light. The phase shift mask can be used to fabricate semiconductor integrated circuits to a smaller minimum feature size and a higher level of integration.