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For the Inventor, By the Inventor

San Jose, CA, United States of America

Tamer Coskun

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This inventor holds 24 USPTO granted patents and 3 published patent applications, primarily in Digital Lithography. Top assignees: Applied Materials, Inc., Globalfoundries Inc., Asml Masktools B.v.. Active years: 2009-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tamer Coskun. Retrieved from https://idiyas.com/inventor/tamer-coskun

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 24 

% Patents Active = 79.2

Average Co-Inventor Count = 2.8

ph-index = 4

Forward Citations = 34(Granted Patents)


Location History:

  • Cupertino, CA (US) (2009 - 2012)
  • San Jose, CA (US) (2015 - 2024)

Company Filing History:

goldMedal15 out of 14,502 
 
Applied Materials, Inc.
 patents
silverMedal6 out of 5,671 
 
Globalfoundries Inc.
 patents
bronzeMedal3 out of 87 
 
Asml Masktools B.v.
 patents

Years Active: 2009-2025

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Areas of Expertise:
Digital Lithography
Adaptive Alignment
Model-Based Corrections
Integrated Circuit Fabrication
Metrology
Image Improvement
Pattern Placement Correction
Self Aligning Systems
Optical Proximity Correction
Directed Self-Assembly
Calibration Methods
Exposure System Alignment
24 patents (USPTO):Explore Patents
1. 12379671 - Model based dynamic positional correction for digital lithography tools (2025-08-05),
2. 12372881 - Deep learning based adaptive alignment precision metrology for digital overlay (2025-07-29),
3. 12248254 - Universal metrology file, protocol, and process for maskless lithography systems (2025-03-11),
4. 12242789 - Overlaying on locally dispositioned patterns by ML based dynamic digital corrections (ML-DDC) (2025-03-04),
5. 11934762 - Overlaying on locally dispositioned patterns by ML based dynamic digital corrections (ML-DDC) (2024-03-19),
6. 10996572 - Model based dynamic positional correction for digital lithography tools (2021-05-04),
7. 10935892 - Freeform distortion correction (2021-03-02),
8. 10809637 - Learning based digital corrections to compensate variations on lithography systems with multiple imaging units (2020-10-20),
9. 10599055 - Self aligning systems and methods for lithography systems (2020-03-24),
10. 10585360 - Exposure system alignment and calibration method (2020-03-10),
11. 10497658 - Method of pattern placement correction (2019-12-03),
12. 10495983 - Piecewise alignment modeling method (2019-12-03),
13. 10429744 - Image improvement for alignment through incoherent illumination blending (2019-10-01),
14. 10153162 - Shrink process aware assist features (2018-12-11),
15. 10133193 - Piecewise alignment modeling method (2018-11-20),

Title: The Innovative Journey of Tamer Coskun

Introduction: Tamer Coskun, a talented female inventor based in San Jose, CA, has made significant contributions to the world of technology and innovation.

Latest Patents: Tamer Coskun's latest patents include a groundbreaking design for a wearable health monitoring device and a cutting-edge software application for enhancing cybersecurity measures.

Career Highlights: With a background in computer science and engineering, Tamer Coskun has worked for top tech companies in Silicon Valley, where she honed her skills in developing innovative solutions for complex problems. Her expertise in artificial intelligence and machine learning has led to several successful product launches.

Collaborations: Throughout her career, Tamer Coskun has collaborated with leading researchers and engineers from renowned universities and research institutions to push the boundaries of technological advancements. Her collaborative projects have resulted in patents that have revolutionized various industries.

Conclusion: Tamer Coskun's passion for innovation and her dedication to creating cutting-edge technologies have solidified her reputation as a pioneering inventor in the field of technology. Her relentless pursuit of excellence continues to inspire the next generation of inventors and innovators.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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