Saitama, Japan

Takuo Nishida

This inventor holds 6 USPTO granted patents and 2 published patent applications. Top assignee: Lintec Corporation. Active years: 2010-2020.

USPTO Granted Patents = 6 

% Patents Active = 100.0

Average Co-Inventor Count = 2.6

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Saitama, JP (2010 - 2012)
  • Tokyo, JP (2015 - 2018)
  • Munich, DE (2020)

Company Filing History:


Years Active: 2010-2020

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6 patents (USPTO):Explore Patents

Title: Takuo Nishida: Innovator in Semiconductor Processing

Introduction

Takuo Nishida is a prominent inventor based in Saitama, Japan. He has made significant contributions to the field of semiconductor processing, holding a total of 6 patents. His work focuses on enhancing the efficiency and reliability of semiconductor-related materials.

Latest Patents

Nishida's latest patents include a semiconductor processing sheet that features a base material and a pressure-sensitive adhesive layer. This adhesive layer contains two types of acrylic polymers, which are designed to improve the performance of semiconductor processing. Another notable patent is for a sheet used in semiconductor-related-member processing, which aims to enhance the removability of the processing sheet while maintaining the reliability of chips manufactured from semiconductor-related members.

Career Highlights

Takuo Nishida is currently employed at Lintec Corporation, where he continues to innovate in the semiconductor industry. His work has been instrumental in developing materials that meet the evolving demands of semiconductor technology.

Collaborations

Nishida has collaborated with notable colleagues, including Akihito Yamada and Osamu Takeuchi, to advance research and development in semiconductor processing.

Conclusion

Takuo Nishida's contributions to semiconductor processing demonstrate his commitment to innovation and excellence in the field. His patents reflect a deep understanding of material science and its applications in technology.

Profile summary based on public USPTO records.
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