Annaka, Japan

Takao Abe

This inventor holds 36 USPTO granted patents and 1 EPO patent, primarily in Silicon Crystal Technology. Top assignees: Shin-Etsu Handotai Co., Ltd., Shin-Etsu Chemical Co., Ltd., Shin-Etsu Handotai Kabushiki Kaisha. Active years: 1989-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takao Abe. Retrieved from https://idiyas.com/inventor/takao-abe-ql1s8zwf

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 91.7


Average Co-Inventor Count = 2.4

ph-index = 14

Forward Citations = 465(Granted Patents)


Location History:

  • Yanase, Annaka-shi, Gunma-ken, JP (1994)
  • Gunma-ken, JP (2002 - 2003)
  • Gunma, JP (1990 - 2010)
  • Annaka, JP (1989 - 2023)

Company Filing History:


Years Active: 1989-2023

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Areas of Expertise:
Silicon Wafer
Single Crystal
Solar Cell
Photovoltaic Module
Czochralski Growth
SOI Substrate
Induction Heating
Heat Treatment
Optical Device
Doping Method
Thin-Film Layer
Semiconductor Device
36 patents (USPTO):Explore Patents

Title: Innovator Takao Abe: Pioneering Advances in Silicon Technology

Introduction: Takao Abe, based in Annaka, Japan, is a renowned inventor celebrated for his significant contributions to the field of silicon technology. With an impressive portfolio of 36 patents, Abe's work facilitates advancements in solid-state image sensors and single-crystal manufacturing.

Latest Patents: Among Takao Abe's latest patents are innovative designs for a silicon single crystal substrate and silicon epitaxial wafer specifically tailored for solid-state image sensors. This invention involves crafting a p-type silicon single crystal substrate where gallium serves as the main dopant, maintaining a boron concentration of 5×10 atoms/cm³ or less. This development empowers solid-state image sensors by effectively mitigating residual image characteristics. Furthermore, Abe also developed a single-crystal manufacturing apparatus utilizing the Czochralski method, designed to accommodate hot zone components within a main chamber and facilitate improved productivity for larger diameter single crystals, specifically those around 200 mm or more.

Career Highlights: Throughout his career, Takao Abe has made impactful strides while working at notable companies, including Shin-Etsu Handotai Co., Ltd. His extensive experience in semiconductor manufacturing has solidified him as a key player in evolving technologies pivotal for various industries.

Collaborations: Abe's innovative journey has seen collaborations with esteemed colleagues such as Norihiro Kobayashi and Masatake Katayama, further enhancing the development and application of his pioneering ideas.

Conclusion: Takao Abe stands out as a leading inventor in silicon technology, whose creations significantly influence the efficiency of solid-state image sensors and single-crystal manufacturing apparatus. His relentless pursuit of innovation continues to inspire advancements within the industry, contributing to the enhancement of modern technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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