Takahisa Otsuka is a prominent inventor based in Koshi, Japan, known for his significant contributions to substrate processing technology. With a remarkable portfolio of 18 patents, Otsuka continues to advance the field of liquid processing apparatus and methods.

Latest Patents

Among his latest inventions, Otsuka has developed a substrate liquid processing apparatus that optimizes the application of processing liquids onto substrates. This innovative apparatus features a substrate holding unit and an outer nozzle that discharges processing liquid onto the substrate's surface, ensuring that at least the central portion is covered by a liquid film. Additionally, the system includes an actuator that can adjust the height or discharge angle of the outer nozzle. Moreover, his recent work culminates in a substrate processing method which comprises a dual cleaning process utilizing two different cleaning solutions, enhancing substrate cleanliness effectively.

Career Highlights

Takahisa Otsuka has played an instrumental role in the innovations at Tokyo Electron Limited, a well-respected company in the semiconductor and electronic manufacturing sectors. His experience in developing advanced technologies has solidified his reputation as a leading inventor in substrate processing.

Collaborations

Throughout his career, Otsuka has collaborated with notable individuals such as Tsuyoshi Shibata and Gentaro Goshi. These partnerships have facilitated the development of cutting-edge solutions in the realm of substrate processing, showcasing the importance of teamwork in technological advancements.

Conclusion

Takahisa Otsuka's inventive spirit and dedication to his craft continue to shape the future of substrate processing technology. With a robust portfolio of patents and collaborative efforts with esteemed colleagues, Otsuka remains a vital figure in the innovation landscape, driving forward advancements that impact various industries globally.

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