The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2020
Filed:
Jun. 27, 2018
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Hiroyuki Higashi, Kumamoto, JP;
Takahisa Otsuka, Kumamoto, JP;
Kazuyoshi Shinohara, Kumamoto, JP;
Takashi Nakazawa, Kumamoto, JP;
Seiya Fujimoto, Kumamoto, JP;
Yuichi Douki, Kumamoto, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/3065 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67069 (2013.01); H01L 21/3065 (2013.01); H01L 21/30608 (2013.01); H01L 21/6708 (2013.01); H01L 21/67017 (2013.01); H01L 21/67028 (2013.01);
Abstract
The substrate processing method according to an exemplary embodiment includes a low temperature dissolving processing and an etching processing. The low temperature dissolving processing dissolves oxygen in an alkaline aqueous solution cooled to a predetermined temperature lower than the room temperature. The etching processing etches a substrate by supplying the alkaline aqueous solution in which oxygen is dissolved to the substrate.