Company Filing History:
Years Active: 2006-2020
Title: Taek-Mo Chung: Innovator in Metal Precursors and Thin Film Technology
Introduction
Taek-Mo Chung is a prominent inventor based in Daejeon, South Korea. He has made significant contributions to the field of chemical technology, particularly in the development of metal precursors and thin film manufacturing processes. With a total of 6 patents to his name, Chung's work has advanced the capabilities of material science.
Latest Patents
Chung's latest patents include a novel metal precursor designed for creating metal oxides. This innovative precursor boasts improved thermal stability and volatility, enabling the production of high-quality metal oxide thin films at excellent growth rates and low temperatures. Another significant patent involves a strontium precursor that contains a beta-diketonate compound. This strontium precursor is noted for its superior thermal stability and volatility, allowing for the formation of quality strontium thin films.
Career Highlights
Chung is affiliated with the Korea Research Institute of Chemical Technology, where he has been instrumental in advancing research and development in chemical technologies. His work has not only contributed to academic knowledge but has also had practical applications in various industries.
Collaborations
Chung has collaborated with notable colleagues, including Ki-Seok An and Chang Gyoun Kim. These partnerships have fostered a collaborative environment that enhances innovation and research outcomes.
Conclusion
Taek-Mo Chung's contributions to the field of chemical technology through his patents and research have positioned him as a key figure in the development of advanced materials. His work continues to influence the industry and inspire future innovations.