The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2020
Filed:
Oct. 11, 2016
Applicant:
Korea Research Institute of Chemical Technology, Daejeon, KR;
Inventors:
Bo Keun Park, Daejeon, KR;
Taek-Mo Chung, Daejeon, KR;
Dong Ju Jeon, Daejeon, KR;
Jeong Hwan Han, Daejeon, KR;
Ji Hyeun Nam, Incheon, KR;
Chang Gyoun Kim, Daejeon, KR;
Eun Ae Jung, Daegu, KR;
Assignee:
KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY, Daejeon, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07F 5/00 (2006.01); C07F 7/22 (2006.01); H01L 21/02 (2006.01); C23C 16/18 (2006.01); C07C 259/06 (2006.01); C23C 16/40 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C07F 7/2224 (2013.01); C07C 259/06 (2013.01); C07F 5/00 (2013.01); C23C 16/18 (2013.01); C23C 16/407 (2013.01); C23C 16/45525 (2013.01); H01L 21/0262 (2013.01); H01L 21/02565 (2013.01);
Abstract
A novel metal precursor having improved thermal stability and volatility is provided. Also provided herein are: a method for readily manufacturing a good quality metal oxide thin film at an excellent growth rate at low temperature by using the metal precursor; and a thin film manufactured by using the same.