Incheon, South Korea

Ji Hyeun Nam

This inventor holds 1 USPTO granted patent. Top assignee: Korea Research Institute of Chemical Technology. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ji Hyeun Nam. Retrieved from https://idiyas.com/inventor/ji-hyeun-nam

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Ji Hyeun Nam: Innovator in Metal Precursor Technology

Introduction

Ji Hyeun Nam is a notable inventor based in Incheon, South Korea. He has made significant contributions to the field of chemical technology, particularly in the development of metal precursors for creating metal oxides. His innovative work has the potential to enhance the manufacturing processes of thin films used in various applications.

Latest Patents

Ji Hyeun Nam holds a patent for a novel metal precursor designed for making metal oxides. This invention features improved thermal stability and volatility, which are crucial for the effective production of high-quality metal oxide thin films. The patent outlines a method for manufacturing these thin films at an excellent growth rate and low temperature, showcasing the efficiency and practicality of his approach.

Career Highlights

Nam is affiliated with the Korea Research Institute of Chemical Technology, where he continues to advance his research and development efforts. His work is characterized by a commitment to innovation and excellence in the field of chemical technology.

Collaborations

Some of his notable coworkers include Eun Ae Jung and Taek-Mo Chung, who contribute to the collaborative environment at the Korea Research Institute of Chemical Technology. Their combined expertise fosters a culture of innovation and progress within the organization.

Conclusion

Ji Hyeun Nam's contributions to metal precursor technology exemplify the impact of innovative thinking in the field of chemical engineering. His patent for a novel metal precursor not only enhances manufacturing processes but also sets a foundation for future advancements in thin film technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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