Ishioka, Japan

Tadayoshi Tsuchiya

USPTO Granted Patents = 5 

Average Co-Inventor Count = 2.2

ph-index = 1

Forward Citations = 4(Granted Patents)


Location History:

  • Ishioka, JP (2014 - 2015)
  • Tokyo, JP (2015)

Company Filing History:


Years Active: 2014-2015

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5 patents (USPTO):

Title: Tadayoshi Tsuchiya: Innovator in Nitride Semiconductor Technology

Introduction

Tadayoshi Tsuchiya is a prominent inventor based in Ishioka, Japan. He has made significant contributions to the field of semiconductor technology, particularly in nitride semiconductors. With a total of 5 patents to his name, Tsuchiya's work has had a considerable impact on the development of high-performance electronic devices.

Latest Patents

Tadayoshi Tsuchiya's latest patents include innovative advancements in nitride semiconductor wafers and elements. One of his notable patents is for a nitride semiconductor wafer designed for high-electron-mobility transistors. This wafer features a substrate and a buffer layer composed of alternating layers of AlGaN, with specific doping to enhance performance. Another significant patent involves a nitride semiconductor element that boasts a high reverse breakdown voltage. This invention includes a vertical-type Schottky barrier diode with a unique structure that optimizes its electrical properties.

Career Highlights

Throughout his career, Tadayoshi Tsuchiya has worked with reputable companies such as Hitachi Metals, Ltd. and Hitachi Cable, Inc. His experience in these organizations has allowed him to refine his expertise in semiconductor technology and contribute to various innovative projects.

Collaborations

Tadayoshi Tsuchiya has collaborated with notable colleagues, including Naoki Kaneda and Tomoyoshi Mishima. These partnerships have fostered a collaborative environment that has led to the advancement of semiconductor technologies.

Conclusion

Tadayoshi Tsuchiya's contributions to nitride semiconductor technology exemplify his innovative spirit and dedication to advancing the field. His patents and collaborations reflect a commitment to excellence in engineering and technology.

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