Hsinchu, Taiwan

Ta-Hone Yang

USPTO Granted Patents = 10 

Average Co-Inventor Count = 2.7

ph-index = 2

Forward Citations = 15(Granted Patents)


Location History:

  • Toufen Township, Miaoli County, TW (2013)
  • Miaoli County, TW (2016)
  • Hsinchu, TW (2014 - 2018)

Company Filing History:


Years Active: 2013-2018

Loading Chart...
10 patents (USPTO):Explore Patents

Title: Innovations by Ta-Hone Yang

Introduction

Ta-Hone Yang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 10 patents. His work focuses on methods and systems that enhance the efficiency and accuracy of wafer defect detection and surface structure analysis.

Latest Patents

Among his latest patents, one notable invention is the "Method and system for detecting defects of wafer by wafer sort." This method introduces a wafer sort testing apparatus that obtains a DTL or ADART result. It highlights a plurality of repaired sites in a wafer based on these results, allowing for precise identification of defects. Another significant patent is the "Method for measuring and analyzing surface structure of chip or wafer." This method involves obtaining an image of the surface structure, performing image extraction, and comparing it with a standard image to derive critical data regarding surface characteristics.

Career Highlights

Ta-Hone Yang is currently employed at Macronix International Co., Ltd., where he continues to innovate in the semiconductor industry. His expertise in defect detection and surface analysis has positioned him as a key figure in advancing semiconductor manufacturing processes.

Collaborations

He has collaborated with notable coworkers, including Kuang-Chao Chen and Tuung Luoh, contributing to various projects that enhance the capabilities of semiconductor technologies.

Conclusion

Ta-Hone Yang's contributions to the field of semiconductor technology through his innovative patents demonstrate his commitment to advancing the industry. His work not only improves defect detection methods but also enhances the understanding of surface structures in chips and wafers.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…