The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 16, 2018

Filed:

Apr. 23, 2015
Applicant:

Macronix International Co., Ltd., Hsinchu, TW;

Inventors:

Tuung Luoh, Hsinchu, TW;

I-Jen Huang, Hsinchu, TW;

Ling-Wuu Yang, Hsinchu, TW;

Ta-Hone Yang, Hsinchu, TW;

Kuang-Chao Chen, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G01R 31/28 (2006.01); G01R 31/265 (2006.01);
U.S. Cl.
CPC ...
G01R 31/2831 (2013.01); G01R 31/2653 (2013.01);
Abstract

A method for detecting defects of wafer by wafer sort is introduced. In the method, a wafer sort testing apparatus is used to obtain a DTL or ADART result, wherein a plurality of repaired sites in a wafer is highlighted according to the DTL or ADART result. A plurality of physical locations of the repaired sites is then output. An analysis equipment is used to match the physical locations with a graphic data system (GDS) design layout coordinate of the wafer so as to generate a data correlating with defects at the repaired sites.


Find Patent Forward Citations

Loading…