The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 2015

Filed:

Feb. 12, 2014
Applicant:

Macronix International Co., Ltd., Hsinchu, TW;

Inventors:

Tuung Luoh, Hsinchu, TW;

Ling-Wuu Yang, Hsinchu, TW;

Ta-Hone Yang, Hsinchu, TW;

Kuang-Chao Chen, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/225 (2006.01);
U.S. Cl.
CPC ...
G01N 23/2251 (2013.01);
Abstract

An electron beam (E beam) inspection optimization is provided, in which a plurality of initial inspection regions in a chip are obtained, wherein a center of each of the initial inspection regions is a defect point. Thereafter, reset inspection regions are regenerated without overlap, wherein each of the reset inspection regions is within a scope covered by a field of view (FOV) and the scope contains at least one of the defect points. Afterwards, a center of the reset inspection region is transferred into an inspection center, and then an E beam inspection is performed on the inspection center.


Find Patent Forward Citations

Loading…