T Todd Crkvenac

Title: T Todd Crkvenac: Innovator in Chemical Mechanical Polishing Technology

Introduction

T Todd Crkvenac is a notable inventor based in Hockessin, Delaware. He has made significant contributions to the field of chemical mechanical polishing, holding a total of 4 patents. His work focuses on developing advanced polishing pads that enhance the efficiency and effectiveness of semiconductor, optical, and magnetic substrate processing.

Latest Patents

Crkvenac's latest patents include innovative designs for chemical mechanical polishing pads. One of his notable inventions is a polishing pad suitable for planarizing various substrates. This pad boasts an ultimate tensile strength of at least 3,000 psi (20.7 MPa) and features a polymeric matrix with closed cell pores. The average diameter of these pores ranges from 1 to 50 micrometers, representing 1 to 40 volume percent of the pad. The pad's texture is characterized by an exponential decay constant, τ, of 1 to 10 micrometers, resulting from the natural porosity of the polymeric matrix and a surface texture developed through periodic or continuous conditioning with an abrasive. Additionally, he has developed a polishing pad with a pressure relief channel, which includes a window formed in the pad that connects to a void-pressure relief channel extending to the periphery.

Career Highlights

Crkvenac has built a successful career in the field of materials science and engineering. He is currently associated with Rohm and Haas Electronic Materials CMP Holdings, Inc., where he continues to innovate and develop new technologies in chemical mechanical polishing.

Collaborations

Throughout his career, Crkvenac has collaborated with several professionals in the industry, including Clyde A Fawcett and Kenneth A Prygon. These collaborations have contributed to the advancement of polishing technologies and have fostered a spirit of innovation within the field.

Conclusion

T Todd Crkvenac's contributions to the field of chemical mechanical polishing are significant and impactful. His innovative patents and collaborations highlight his dedication to advancing technology in this critical area. His work continues to influence the industry and pave the way for future innovations.