The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2007
Filed:
Jun. 16, 2004
Applicants:
T. Todd Crkvenac, Hockessin, DE (US);
Robert T. Gamble, Boothwyn, PA (US);
Jason M. Lawhorn, Newark, DE (US);
Inventors:
T. Todd Crkvenac, Hockessin, DE (US);
Robert T. Gamble, Boothwyn, PA (US);
Jason M. Lawhorn, Newark, DE (US);
Assignee:
Rohm and Haas Electronic Materials CMP Holdings, Inc., Newark, DE (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B32B 3/20 (2006.01); B24D 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention provides a chemical mechanical polishing pad comprising a window formed in the polishing pad, the window having a void provided on a side thereof. The polishing pad further comprises a void-pressure relief channel provided in the polishing pad from the void to a periphery of the polishing pad.