Location History:
- Hillsboro, OR (US) (2006)
- San Jose, CA (US) (2010 - 2021)
Company Filing History:
Years Active: 2006-2021
Title: Sven Eric Henrichs: Innovator in Lithography Technology
Introduction
Sven Eric Henrichs is a notable inventor based in Hillsboro, OR (US). He has made significant contributions to the field of lithography technology, holding a total of 5 patents. His work focuses on improving the precision and efficiency of mask processes in integrated circuit design.
Latest Patents
Henrichs' latest patents include innovative techniques that enhance mask targeting and image fidelity. One of his patents, titled "Consistent mask targeting through standardized drop-in-cells," describes a method for generating a test mask that converts integrated circuit designs into physical layouts. This method incorporates sub-resolution assist features (SRAFs) to ensure consistent mask targeting across multiple masks derived from the test mask. Another significant patent, "Lithography mask having sub-resolution phased assist features," outlines techniques for using sub-resolution phased assist features (SPAF) to improve pattern fidelity and mitigate issues related to inverted aerial images. These advancements do not require changes to existing design rules or manufacturing processes, making them highly applicable in current fabrication environments.
Career Highlights
Sven Eric Henrichs is currently employed at Intel Corporation, where he continues to push the boundaries of lithography technology. His expertise in mask processes has positioned him as a key player in the development of advanced semiconductor manufacturing techniques.
Collaborations
Throughout his career, Henrichs has collaborated with esteemed colleagues such as Swaminathan Sivakumar and Richard E Schenker. These partnerships have fostered innovation and contributed to the success of various projects within the semiconductor industry.
Conclusion
Sven Eric Henrichs stands out as a prominent inventor in the field of lithography, with a focus on enhancing mask processes for integrated circuits. His contributions through patents and collaborations continue to shape the future of semiconductor technology.