The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 2021
Filed:
Nov. 28, 2017
Applicant:
Intel Corporation, Santa Clara, CA (US);
Inventors:
Harsha Grunes, Beaverton, OR (US);
Christopher N. Kenyon, Portland, OR (US);
Sven Henrichs, San Jose, CA (US);
Assignee:
Intel Coropration, Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/36 (2012.01);
U.S. Cl.
CPC ...
G03F 1/36 (2013.01);
Abstract
A mask process development having a consistent mask targeting is described. A method includes receiving an integrated circuit (IC) design. A test mask is generated that converts the IC design into one or more physical layouts. A set of one or more sub-resolution assist features (SRAFs) is inserted into the test mask. The set of one or more SRAFs is inserted into one or more other masks, which are derived from the test mask for mask targeting, such that the test mask and the one or more other masks include a same set of the one or more SRAFs.