Shunan, Japan

Susumu Tauchi

This inventor holds 31 USPTO granted patents and 8 published patent applications, primarily in Plasma Processing. Top assignees: Hitachi-High-Technologies Corporation, Hitachi High-Tech Corporation. Active years: 2005-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Susumu Tauchi. Retrieved from https://idiyas.com/inventor/susumu-tauchi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 31 

% Patents Active = 77.4

Average Co-Inventor Count = 3.3

ph-index = 8

Forward Citations = 721(Granted Patents)


Location History:

  • Tokuyama, JP (2005)
  • Shunan, JP (2007 - 2016)
  • Tokyo, JP (2016 - 2020)

Company Filing History:


Years Active: 2005-2020

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Areas of Expertise:
Plasma Processing Apparatus
Vacuum Processing
Electrode Cover
Upper Chamber
Lower Chamber
Cover Ring
Grounded Electrode
Plasma Treatment Method
Operating Method
Processing Method
Vacuum Technology
Plasma Treatment
31 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Susumu Tauchi

Introduction: Susumu Tauchi, an accomplished inventor based in Shunan, Japan, has made significant contributions to the field of plasma processing technology. With a remarkable portfolio of 31 patents, Tauchi's work exemplifies the importance of innovation in advancing modern manufacturing processes.

Latest Patents: Among his most recent inventions is a sophisticated Plasma Processing Apparatus, which features a vacuum container designed with a processing chamber for wafer treatment using plasma. This apparatus incorporates a unique mechanism where at least one component of the vacuum container can be moved and detached in a horizontal direction relative to the base plate. An innovative lifter mechanism is arranged alongside the vacuum container, enabling vertical movement of the detachable member. The lifter's design includes a coupling portion that is adjusted along the vertical shaft and a turning shaft that allows for horizontal rotation of the detachable component, expanding its versatility in plasma processing applications.

Career Highlights: Throughout his career, Susumu Tauchi has worked with notable companies, including Hitachi High-Technologies Corporation and Hitachi High-Tech Corporation. His tenure at these companies has not only honed his expertise in plasma technology but also positioned him as a leading inventor in the industry. His contributions have paved the way for advancements in semiconductor manufacturing and other high-tech fields.

Collaborations: Tauchi has collaborated with talented professionals, including Akitaka Makino and Hideki Kihara. These partnerships reflect his ability to work alongside other innovative minds, driving the development of cutting-edge technology within the plasma processing domain.

Conclusion: Susumu Tauchi's contributions to the invention and enhancement of plasma processing apparatuses showcase the ongoing evolution of technology in manufacturing. With a strong background and numerous patents to his name, Tauchi continues to be a pivotal player in the field, inspiring future generations of inventors and researchers.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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