The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2015
Filed:
Aug. 30, 2010
Susumu Tauchi, Shunan, JP;
Hideaki Kondo, Kudamatsu, JP;
Teruo Nakata, Yokohama, JP;
Keita Nogi, Tokyo, JP;
Atsushi Shimoda, Hiratsuka, JP;
Takafumi Chida, Chigasaki, JP;
Susumu Tauchi, Shunan, JP;
Hideaki Kondo, Kudamatsu, JP;
Teruo Nakata, Yokohama, JP;
Keita Nogi, Tokyo, JP;
Atsushi Shimoda, Hiratsuka, JP;
Takafumi Chida, Chigasaki, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
A vacuum processing apparatus which includes an atmospheric transfer chamber having a plurality of cassette stands for transferring a wafer, a lock chamber for storing the wafer, a first vacuum transfer chamber to which the wafer from the lock chamber is transferred, a transfer intermediate chamber connected to the first vacuum transfer chamber, and a second vacuum transfer chamber connected to the transfer intermediate chamber. At least one vacuum processing chamber is connected to the first vacuum transfer chamber, and two or more vacuum processing chambers are connected to a rear side of the second vacuum transfer chamber. A plurality of gate valves are disposed between the first vacuum transfer chamber and each of the lock chamber, the transfer intermediate chamber, and the vacuum processing chamber coupled to the first vacuum transfer chamber. A control unit is also provided for controlling operation of the gate valves.