The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 10, 2014

Filed:

Feb. 07, 2011
Applicants:

Ryoichi Isomura, Kudamatsu, JP;

Susumu Tauchi, Shunan, JP;

Hideaki Kondo, Kudamatsu, JP;

Inventors:

Ryoichi Isomura, Kudamatsu, JP;

Susumu Tauchi, Shunan, JP;

Hideaki Kondo, Kudamatsu, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B65G 49/07 (2006.01); H01L 21/677 (2006.01);
U.S. Cl.
CPC ...
Abstract

The vacuum processing apparatus is comprised of two vacuum transfer vessels in which a wafer is transferred through; two vacuum process vessels connected to these vacuum transfer vessels respectively; an intermediate chamber vessel capable of storing thereinto the wafer connected between the vacuum transfer vessels; a lock chamber connected to one of the vacuum transfer vessels; and a plurality of valves disposed among the vacuum transfer vessels, the vacuum process vessels, the intermediate chamber vessel, and the lock chamber respectively, for airtightly opening/closing communications among these vessels and the chamber; in which any one of the valves disposed on both sides of the intermediate chamber vessel is closed before the valves disposed between processing chambers of the vacuum process vessels and vacuum transfer chambers of the vacuum transfer vessels is opened.


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