The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 2012
Filed:
Jan. 04, 2010
Susumu Tauchi, Shunan, JP;
Akitaka Makino, Hikari, JP;
Susumu Tauchi, Shunan, JP;
Akitaka Makino, Hikari, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
The invention provides a highly reliable plasma processing apparatus having stable sealing performance. The vacuum processing apparatus comprises a vacuum vessel having its inside decompressed; an opening disposed in a wall of the vacuum vessel for communicating the inside with the outside thereof and through which a sample to be processed is taken in and out; a valve bodydisposed outside the wall for airtightly sealing or opening the opening; and a drive unit for driving the valve body to carry out the sealing or opening operation, the drive unit comprising a first membercoupled to an actuatorthat moves along a substantially linear first direction as a result of operation of the actuator, a second membercoupled to the first memberthat moves along a substantially linear second direction that intersects with the first direction, and the valve bodycoupled to the second member that seals the opening as a result of the movement of the second member.