This inventor holds 8 USPTO granted patents and 1 EPO patent. Top assignees: Canon Kabushiki Kaisha, Hitachi-High-Technologies Corporation, Other. Active years: 1992-2006.
Location History:
- Hachiohji, JP (1992)
- Tama, JP (1998 - 2001)
- Tokyo, JP (2004 - 2006)
Company Filing History:
7 out of 92,842 
2 out of 2,874 
1 out of 834,411 Years Active: 1992-2006
Title: Susumu Gotoh: Innovator in Electron Beam Technology
Introduction
Susumu Gotoh is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of electron beam technology, holding a total of 8 patents. His work has advanced the capabilities of electron beam writing and exposure equipment, which are essential in various high-tech applications.
Latest Patents
Gotoh's latest patents include innovative technologies such as electron beam writing equipment and methods. The electron beam writing equipment features an electron source and an electron optics system designed for scanning an electron beam on a sample. This system utilizes deflection means with at least two different deflection speeds to achieve high-speed scanning. An objective lens is employed to form a desired pattern on the sample, while the electron beam is moved rapidly to repeat the formation of a patterned beam. Additionally, the system incorporates low-speed scanning for beam correction, ensuring precision through the use of detectors for back scattered or secondary electrons.
Another notable patent is the electron beam exposure equipment, which allows for optical adjustments in an electron optics system using a doublet lens. This equipment is designed for large field projection and includes mechanisms for measuring the position of an electron beam near an image plane. The control means in this system feeds back the measured results to aligners or the intensity of the lenses, enhancing the accuracy of the exposure process.
Career Highlights
Throughout his career, Susumu Gotoh has worked with leading companies in the technology sector, including Canon and Hitachi High-Technologies Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas in electron beam technology.
Collaborations
Gotoh has collaborated with notable colleagues such as Masato Muraki and Osamu Kamimura. Their combined expertise has contributed to the advancement of electron beam technologies and the successful development of various patents.
Conclusion
Susumu Gotoh's contributions to electron beam technology have established him as a key figure in the field. His innovative patents and collaborations with industry leaders continue to influence advancements in high-tech applications.