The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 23, 2006
Filed:
Sep. 29, 2004
Yasunari Sohda, Kawasaki, JP;
Hiroya Ohta, Kodaira, JP;
Osamu Kamimura, Kokubunji, JP;
Susumu Gotoh, Tokyo, JP;
Yasunari Sohda, Kawasaki, JP;
Hiroya Ohta, Kodaira, JP;
Osamu Kamimura, Kokubunji, JP;
Susumu Gotoh, Tokyo, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
Electron beam writing equipment has an electron source and an electron optics system for scanning an electron beam emitted from the electron source on a sample via deflection means having at least two different deflection speeds. An objective lens is used to form a desired pattern on the sample The electron beam is moved by high speed scanning with the deflection means to repeat formation of a patterned beam. The electron beam is moved on the mark for beam correction by low speed scanning with the deflection means in synchronization with one cycle of the repetition. The position or the deflection distance of the electron beam or blanking time is corrected using detectors for back scattered or secondary electrons.