The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 2005
Filed:
Aug. 06, 2003
Yasunari Sohda, Kawasaki, JP;
Osamu Kamimura, Kokubunji, JP;
Hiroya Ohta, Kodaira, JP;
Susumu Gotoh, Tokyo, JP;
Yasunari Sohda, Kawasaki, JP;
Osamu Kamimura, Kokubunji, JP;
Hiroya Ohta, Kodaira, JP;
Susumu Gotoh, Tokyo, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
There is provided an electron beam exposure technique which permits optical adjustment in an electron optics system using a doublet lens necessary for large field projection. Electron beam exposure equipment having a part forming one image by at least two electromagnetic lenses, has means measuring the position of an electron beam near an image plane with changing excitation of at least two lenses at the same time; and control means feeding back the measured result to aligners or the intensity of the lenses.