Sung-Hsiung Wang

Title: The Innovative Contributions of Sung-Hsiung Wang

Introduction

Sung-Hsiung Wang is a prominent inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of electronics, particularly in the development of advanced semiconductor technologies. With a total of 9 patents to his name, Wang's work has had a lasting impact on the industry.

Latest Patents

Wang's latest patents include an inductor utilizing a pad metal layer and a novel ultra-thick metal-copper dual damascene process. The inductor patent describes a design that incorporates a metal spiral, a metal bridge, and a metal interconnect, with the pad metal layer exhibiting lower resistivity than the metal spiral. This innovation enhances the performance of inductors in electronic devices. The dual damascene process patent outlines methods characterized by short cycle times and low costs, involving the etching and filling of dielectric layers with conductive metals like copper. These advancements streamline manufacturing processes in semiconductor fabrication.

Career Highlights

Throughout his career, Wang has worked with notable companies such as United Microelectronics Corporation and Taiwan Semiconductor Manufacturing Company Limited. His experience in these leading firms has allowed him to refine his skills and contribute to groundbreaking technologies in the semiconductor industry.

Collaborations

Wang has collaborated with esteemed colleagues, including Chiung-Sheng Hsiung and Gwo-Shii Yang. These partnerships have fostered innovation and have been instrumental in the development of new technologies.

Conclusion

Sung-Hsiung Wang's contributions to the field of electronics through his patents and collaborations highlight his role as a key innovator in the semiconductor industry. His work continues to influence advancements in technology and manufacturing processes.