The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 12, 2002
Filed:
May. 26, 2000
Sung-Hsiung Wang, Kaohsiung Hsien, TW;
Chan-Lon Yang, Taipei, TW;
United Microelectronics Corp., Hsinchu, TW;
Abstract
A cleaning method for a copper dual damascene process, applicable for cleaning a structure having a dual damascene opening. The method begins with preparing a first chemical solution and a second chemical solution. The first chemical solution includes a deionized water, a hydrogen peroxide, and a surfactant, whereas the second chemical solution includes a deionized water, a hydrogen fluoride, and a hydrogen chloride. A first cleaning step is performed using the first chemical solution to remove particles and polymers that remain on a surface of a copper layer and the dual damascene opening. This is followed by performing a second cleaning step using the second chemical solution to remove a copper oxide layer on the copper layer.