Sudesh Saroop

Title: Sudesh Saroop: Innovator in Semiconductor Technology

Introduction

Sudesh Saroop is a notable inventor based in Poughkeepsie, NY (US), recognized for his contributions to semiconductor technology. With a total of five patents to his name, he has made significant advancements in the field, particularly in the design and testing of semiconductor devices.

Latest Patents

One of Sudesh Saroop's latest patents is focused on multi-height fin field effect transistors. This innovation involves the formation of semiconductor fins on a substrate's top surface, where a dielectric material is deposited through anisotropic deposition. The dielectric material layer is patterned to surround the bottom portions of at least one semiconductor fin while avoiding contact with at least one second semiconductor fin. This design allows for the creation of fin field effect transistors with varying channel heights, enhancing device performance.

Another significant patent addresses leakage measurement of through silicon vias. This method involves creating a current leakage measurement structure that includes substrate contacts and sensing circuits. These circuits are designed to detect current leakage from the through substrate vias, ensuring a one-to-one correspondence between substrate contacts and sensing circuits. A built-in self-test engine is also incorporated to monitor current leakage effectively.

Career Highlights

Throughout his career, Sudesh Saroop has worked with prominent companies in the semiconductor industry, including IBM and Globalfoundries Inc. His experience in these organizations has contributed to his expertise and innovative capabilities in semiconductor technology.

Collaborations

Sudesh has collaborated with several talented individuals, including Bhavana Bhoovaraghan and Mukta G Farooq. These partnerships have likely fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Sudesh Saroop's work in semiconductor technology exemplifies the impact of innovation in the field. His patents and career achievements highlight his dedication to advancing technology and improving device performance.