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For the Inventor, By the Inventor

Fairview, TX, United States of America

Steven Lee Prins

USPTO Granted Patents = 10 

Average Co-Inventor Count = 2.5

ph-index = 1

Forward Citations = 4(Granted Patents)


Location History:

  • Richardson, TX (US) (2010)
  • Fairview, TX (US) (2012 - 2022)

Company Filing History:

goldMedal10 out of 29,232 
 
Texas Instruments Corporation
 patents

Years Active: 2010-2022

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10 patents (USPTO):
1. 11522043 - IC with matched thin film resistors (2022-12-06),
2. 11251093 - Poly gate extension design methodology to improve CMOS performance in dual stress liner process flow (2022-02-15),
3. 10734290 - Poly gate extension design methodology to improve CMOS performance in dual stress liner process flow (2020-08-04),
4. 10134643 - Poly gate extension design methodology to improve CMOS performance in dual stress liner process flow (2018-11-20),
5. 9583488 - Poly gate extension design methodology to improve CMOS performance in dual stress liner process flow (2017-02-28),
6. 9343332 - Alignment to multiple layers (2016-05-17),
7. 9117775 - Alignment to multiple layers (2015-08-25),
8. 8252609 - Curvature reduction for semiconductor wafers (2012-08-28),
9. 8216945 - Wafer planarity control between pattern levels (2012-07-10),
10. 7790525 - Method of achieving dense-pitch interconnect patterning in integrated circuits (2010-09-07),

Title: Innovations of Steven Lee Prins

Introduction

Steven Lee Prins is a notable inventor based in Fairview, Texas. He has made significant contributions to the field of integrated circuits, holding a total of 10 patents. His work focuses on enhancing the performance and efficiency of electronic components.

Latest Patents

One of his latest patents is for an integrated circuit (IC) with matched thin film resistors. This method involves fabricating an IC by forming a dielectric layer on a substrate, followed by the deposition of a thin-film resistor (TFR) layer. An underlayer containing carbon is then formed on the TFR layer, and a hard mask layer made of silicon is applied. The process includes several steps of masked etching to create a matched pair of TFRs, which are essential for implementing specific functions within the circuitry. Another significant patent involves a poly gate extension design methodology aimed at improving CMOS performance in a dual stress liner process flow. This innovation addresses the design of NMOS and PMOS transistors, optimizing their gate overhangs for better performance.

Career Highlights

Steven Lee Prins is currently employed at Texas Instruments Corporation, a leading company in the semiconductor industry. His work at Texas Instruments has allowed him to push the boundaries of integrated circuit technology, contributing to advancements that benefit various electronic applications.

Collaborations

Throughout his career, Steven has collaborated with talented individuals such as Younsung Choi and Scott William Jessen. These collaborations have fostered an environment of innovation and creativity, leading to the development of groundbreaking technologies.

Conclusion

Steven Lee Prins is a distinguished inventor whose work in integrated circuits has made a lasting impact on the industry. His patents reflect a commitment to innovation and excellence in technology.

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