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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9343332 B1

PDFFull Text
Date of Patent:
May. 17, 2016

Filed:

Jul. 20, 2015

Alignment to multiple layers

Applicant:

Texas Instruments Incorporated, Dallas, TX (US);

Inventors:

Thomas John Aton, Dallas, TX (US);

Steven Lee Prins, Fairview, TX (US);

Scott William Jessen, Allen, TX (US);

Assignee:

TEXAS INSTRUMENTS INCORPORATED, Dallas, TX (US);

Attorneys:

Jacqueline J. Garner

Frank D. Cimino

Primary Examiner:

Mohammad Islam

Assistant Examiner:

Ratisha Mehta

Int. Cl.
CPC ...
H01L 21/3213 (2006.01); H01L 21/768 (2006.01); H01L 21/283 (2006.01); G03F 1/42 (2012.01); G03F 9/00 (2006.01); H01L 21/28 (2006.01); H01L 21/311 (2006.01); H01L 23/544 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 21/32139 (2013.01); G03F 1/42 (2013.01); G03F 9/7084 (2013.01); H01L 21/283 (2013.01); H01L 21/28123 (2013.01); H01L 21/31144 (2013.01); H01L 21/76816 (2013.01); H01L 21/76877 (2013.01); H01L 21/76897 (2013.01); H01L 23/544 (2013.01); H01L 29/6659 (2013.01); H01L 2223/54426 (2013.01); H01L 2223/54453 (2013.01); H01L 2924/0002 (2013.01);
Abstract

A method of aligning a new pattern to more than one previously defined pattern during the manufacture of an integrated circuit. A method of aligning a photolighography pattern reticle to a first previously defined pattern in a first direction and also aligning the photolithography pattern reticle to a second previously defined pattern in a second direction. A method of aligning a photolighography pattern reticle to two previously defined patterns in the same direction.

Find Patent Forward Citations

Aton, Thomas. (2016). Alignment to multiple layers (U.S. Patent No. 9343332). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9343332

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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