Steve S Y Mak

Title: Steve S Y Mak: Innovator in Semiconductor Technology

Introduction

Steve S Y Mak is a prominent inventor based in Pleasanton, CA (US), known for his significant contributions to semiconductor technology. With a total of 8 patents, he has developed innovative processes that enhance the efficiency and effectiveness of semiconductor manufacturing.

Latest Patents

One of his latest patents is titled "Fluorine free integrated process for etching aluminum including chamber dry clean." This patent describes a fluorine-free integrated process for plasma etching aluminum lines in an integrated circuit structure. The process is performed in a single plasma reactor and utilizes various gases for effective etching. Another notable patent is "Masking methods and etching sequences for patterning electrodes of high density RAM capacitors." This invention outlines a method for etching a noble metal electrode layer to produce semiconductor devices with closely spaced electrodes.

Career Highlights

Throughout his career, Steve has worked with leading companies in the semiconductor industry, including Applied Materials, Inc. and Apple. His expertise in plasma etching and semiconductor device fabrication has made him a valuable asset in these organizations.

Collaborations

Steve has collaborated with notable professionals in the field, including Jeng H Hwang and Chentsau Chris Ying. These collaborations have contributed to the advancement of semiconductor technologies and innovations.

Conclusion

Steve S Y Mak's contributions to the field of semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the industry and drive innovation forward.