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For the Inventor, By the Inventor

Dresden, Germany

Stephan-Detlef Kronholz

USPTO Granted Patents = 10 

Average Co-Inventor Count = 2.9

ph-index = 3

Forward Citations = 43(Granted Patents)


Company Filing History:

goldMedal10 out of 5,671 
 
Globalfoundries Inc.
 patents

Years Active: 2013-2014

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10 patents (USPTO):
1. 8836047 - Reducing defect rate during deposition of a channel semiconductor alloy into an in situ recessed active region (2014-09-16),
2. 8809151 - Transistor comprising an embedded sigma shaped sequentially formed semiconductor alloy (2014-08-19),
3. 8722481 - Superior integrity of high-k metal gate stacks by preserving a resist material above end caps of gate electrode structures (2014-05-13),
4. 8674458 - Transistors with embedded strain-inducing material formed in cavities provided by an oxidizing etch process (2014-03-18),
5. 8664066 - Formation of a channel semiconductor alloy by forming a nitride based hard mask layer (2014-03-04),
6. 8614122 - Formation of a channel semiconductor alloy by forming a hard mask layer stack and applying a plasma-based mask patterning process (2013-12-24),
7. 8536009 - Differential threshold voltage adjustment in PMOS transistors by differential formation of a channel semiconductor material (2013-09-17),
8. 8481381 - Superior integrity of high-k metal gate stacks by preserving a resist material above end caps of gate electrode structures (2013-07-09),
9. 8377786 - Methods for fabricating semiconductor devices (2013-02-19),
10. 8343826 - Method for forming a transistor comprising high-k metal gate electrode structures including a polycrystalline semiconductor material and embedded strain-inducing semiconductor alloys (2013-01-01),

Title: Innovations by Stephan-Detlef Kronholz

Introduction

Stephan-Detlef Kronholz is a prominent inventor based in Dresden, Germany. He has made significant contributions to the field of semiconductor technology, holding a total of 10 patents. His work focuses on enhancing the efficiency and performance of semiconductor devices.

Latest Patents

One of his latest patents is titled "Reducing defect rate during deposition of a channel semiconductor alloy into an in situ recessed active region." This invention addresses the challenges of forming sophisticated high-k metal gate electrode structures. It introduces a highly efficient in situ process technique to create a recess in dedicated active regions and refill it with a semiconductor alloy. The patent emphasizes controlling aluminum contamination during processing to minimize etch-related irregularities.

Another notable patent is "Transistor comprising an embedded sigma shaped sequentially formed semiconductor alloy." This invention allows for the sequential provision of a specifically designed semiconductor material in the drain and source regions of sophisticated transistors. It enables a significant lateral extension of the grown semiconductor materials while maintaining the mechanical integrity of the transistor during processing.

Career Highlights

Stephan-Detlef Kronholz is currently employed at Globalfoundries Inc., a leading company in semiconductor manufacturing. His innovative work has positioned him as a key figure in the industry, contributing to advancements in semiconductor technology.

Collaborations

Throughout his career, Kronholz has collaborated with notable colleagues, including Peter Javorka and Maciej Wiatr. These collaborations have further enriched his research and development efforts in the semiconductor field.

Conclusion

Stephan-Detlef Kronholz's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His work continues to shape the future of semiconductor devices and their applications.

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