The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 17, 2013

Filed:

Aug. 03, 2011
Applicants:

Peter Javorka, Radeburg, DE;

Maciej Wiatr, Dresden, DE;

Stephan-detlef Kronholz, Dresden, DE;

Inventors:

Peter Javorka, Radeburg, DE;

Maciej Wiatr, Dresden, DE;

Stephan-Detlef Kronholz, Dresden, DE;

Assignee:

GLOBALFOUNDRIES Inc., Grand Cayman, KY;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/8234 (2006.01);
U.S. Cl.
CPC ...
Abstract

In sophisticated semiconductor devices, high-k metal gate electrode structures may be provided in an early manufacturing stage wherein the threshold voltage adjustment for P-channel transistors may be accomplished on the basis of a threshold voltage adjusting semiconductor alloy, such as a silicon/germanium alloy, for long channel devices, while short channel devices may be masked during the selective epitaxial growth of the silicon/germanium alloy. In some illustrative embodiments, the threshold voltage adjustment may be accomplished without any halo implantation processes for the P-channel transistors, while the threshold voltage may be tuned by halo implantations for the N-channel transistors.


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