Company Filing History:
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Years Active: 2010-2014
Title: Stanislaw Marek Borowicz: Innovator in Electron Beam Technology
Introduction
Stanislaw Marek Borowicz is a notable inventor based in San Jose, CA, who has made significant contributions to the field of electron beam technology. With a total of 3 patents to his name, Borowicz has developed innovative solutions that enhance the capabilities of electron beam apparatuses.
Latest Patents
One of his latest patents is titled "Sharp scattering angle trap for electron beam apparatus." This invention relates to an electron beam apparatus that includes a source for generating an incident electron beam, an electron lens for focusing the beam onto a substrate surface, and a detector for detecting scattered electrons. The apparatus features a device designed to trap scattered electrons emitted at sharp angles relative to the sample surface plane.
Another significant patent is "Apparatus and method for e-beam dark imaging with perspective control." This method involves focusing an incident electron beam onto a specimen surface and extracting a scattered electron beam. A detection system is used to detect multiple dark field signals, which are then interpolated to generate a final interpolated signal. This innovative approach allows for enhanced imaging capabilities in electron beam applications.
Career Highlights
Throughout his career, Borowicz has worked with prominent companies such as KLA-Tencor Technologies Corporation and KLA-Tencor Corporation. His experience in these organizations has contributed to his expertise in electron beam technology and innovation.
Collaborations
Borowicz has collaborated with talented individuals in his field, including Matthew Lent and Mehran Nasser-Ghodsi. These collaborations have likely fostered an environment of creativity and innovation, leading to the development of advanced technologies.
Conclusion
Stanislaw Marek Borowicz is a distinguished inventor whose work in electron beam technology has led to significant advancements in the field. His patents reflect a commitment to innovation and a deep understanding of the complexities involved in electron beam applications.