The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 2010
Filed:
Jan. 12, 2007
Mehran Naser-ghodsi, Hamilton, MA (US);
Tzu-chin Chuang, Cupertino, CA (US);
Kenneth Krzeczowski, Scotts Valley, CA (US);
Matthew Lent, Livermore, CA (US);
Chris Huang, Cupertino, CA (US);
Stanislaw Marek Borowicz, San Jose, CA (US);
Mehran Naser-Ghodsi, Hamilton, MA (US);
Tzu-Chin Chuang, Cupertino, CA (US);
Kenneth Krzeczowski, Scotts Valley, CA (US);
Matthew Lent, Livermore, CA (US);
Chris Huang, Cupertino, CA (US);
Stanislaw Marek Borowicz, San Jose, CA (US);
KLA-Tencor Technologies Corporation, Milpitas, CA (US);
Abstract
Methods and apparatus for imaging a structure and a related processor-readable medium are disclosed. A surface of a substrate (or a portion thereof) is exposed to a gas composition. The gas composition includes one or more components that etch the substrate upon activation by interaction with a beam of electrons. A beam of electrons is directed to one or more portions of the surface of the substrate that are exposed to the gas composition to etch the one or more portions. A plurality of images is obtained of the one or more portions at different instances of time as the one or more portions are etched. A three-dimensional model of one or more structures embedded within the one or more portions of the substrate is generated from the plurality of images.