The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 18, 2014

Filed:

Nov. 03, 2005
Applicants:

Yehiel Gotkis, Fremont, CA (US);

Garrett Pickard, Mountian View, CA (US);

Stanislaw Marek Borowicz, San Jose, CA (US);

Tzu-chin Chuang, Cupertino, CA (US);

Mehran Nasser-ghodsi, Hamilton, MA (US);

Inventors:

Yehiel Gotkis, Fremont, CA (US);

Garrett Pickard, Mountian View, CA (US);

Stanislaw Marek Borowicz, San Jose, CA (US);

Tzu-Chin Chuang, Cupertino, CA (US);

Mehran Nasser-Ghodsi, Hamilton, MA (US);

Assignee:

KLA-Tencor Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 5/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

One embodiment relates to an electron beam apparatus. The apparatus includes a source for generating an incident electron beam, an electron lens for focusing the incident electron beam so that the beam impinges upon a substrate surface and interacts with surface material so as to cause secondary emission of scattered electrons, and a detector configured to detect the scattered electrons. The apparatus further includes an advantageous device configured to trap the scattered electrons which are emitted at sharp angles relative to the sample surface plane of the substrate surface. Other embodiments are also disclosed.


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