Hwaseong, South Korea

SoonMok Ha

This inventor holds 6 USPTO granted patents and 1 published patent application. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2015-2018.

USPTO Granted Patents = 6 

% Patents Active = 100.0

Average Co-Inventor Count = 4.4

ph-index = 4

Forward Citations = 38(Granted Patents)


Company Filing History:


Years Active: 2015-2018

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6 patents (USPTO):Explore Patents

Title: The Innovative Contributions of SoonMok Ha

Introduction

SoonMok Ha is a prominent inventor based in Hwaseong, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His work focuses on advanced methods for fabricating semiconductor devices, which are crucial for modern electronics.

Latest Patents

One of SoonMok Ha's latest patents is a method of fabricating a semiconductor device. This method includes forming first cell patterns on a substrate, creating a first layer relative to these patterns, and subsequently forming a second cell pattern along with a peripheral pattern on the first layer. The second cell pattern features first holes in a cell region, while the peripheral pattern is situated in a peripheral region. The process also involves filling the first holes, removing the second cell pattern to reveal pillars, and forming second holes that correspond to adjacent cell spacers of the pillars. Furthermore, the method includes removing the pillars to create third holes that align with the respective cell spacers, and etching the substrate using the cell spacers, first cell patterns, and peripheral pattern as etch masks to form a trench.

Another notable patent by SoonMok Ha is related to the manufacturing of semiconductor devices. This method encompasses forming first and second lower structures that include selection elements on designated chip regions of a substrate. It also involves creating first and second mold layers on these lower structures, followed by the formation of first and second support layers. The process includes patterning the first support layer and mold layer to create first holes that expose the first lower structure, and subsequently forming first lower electrodes within these holes. A support pattern is then created by selectively patterning the first support layer while retaining the second support layer, and the first mold layer is removed through an opening. The top surface of the support pattern is designed to be at the same level as the top surface of the second support layer.

Career Highlights

SoonMok Ha is currently employed at Samsung Electronics Co., Ltd., a leading company in the electronics industry. His work at Samsung has allowed him to contribute to cutting-edge technologies in semiconductor manufacturing.

Collaborations

Throughout his career, SoonMok Ha has collaborated with notable colleagues, including Joonsoo Park and Dae-Yong Kang. These collaborations have further enhanced his innovative capabilities and contributions to the field.

Conclusion

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