Albany, NY, United States of America

Sonam D Sherpa

USPTO Granted Patents = 19 

Average Co-Inventor Count = 2.2

ph-index = 2

Forward Citations = 13(Granted Patents)


Location History:

  • Fishkill, NY (US) (2016)
  • Albany, NY (US) (2018 - 2023)

Company Filing History:


Years Active: 2016-2023

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19 patents (USPTO):Explore Patents

Title: Innovations in Microelectronics: The Work of Sonam D. Sherpa

Introduction

Sonam D. Sherpa, based in Albany, NY, is a prominent inventor holding 19 patents, significantly contributing to the field of microelectronics. His groundbreaking work includes innovative processes and techniques that enhance the manufacturing capabilities within the semiconductor industry.

Latest Patents

Among his latest patents is a revolutionary method of atomic layer etching (ALE) of oxide. This process utilizes a carbon tetrafluoride (CF4) based plasma in the modification step to preferentially remove oxygen from silicon oxide surfaces, leading to a silicon-rich layer. The subsequent removal step employs a hydrogen (H2) based plasma to eliminate the silicon-enriched monolayer, offering a versatile ALE solution applicable across various substrate processing situations.

Another notable patent focuses on area-selective etching of silicon nitride layers for microelectronic workpieces. This method leverages the sequential exposure of silicon nitride layers to hydrogen ions and fluorine ions using advanced beam delivery techniques such as ion beam and neutral beam techniques. This approach enables precise, area-selective etching, setting it apart from traditional plasma processing methods that often resulted in large-area etching.

Career Highlights

Sonam D. Sherpa is currently employed with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment and technology sector. His role involves developing cutting-edge solutions tailored for the microelectronics manufacturing landscape, making him a vital asset to the organization.

Collaborations

In his professional journey, Sonam collaborates with esteemed colleagues such as Alok Ranjan and Erdinc Karakas. Their collective efforts contribute to advancing technologies that enhance microelectronic manufacturing processes and improve overall production efficiency.

Conclusion

Sonam D. Sherpa's contributions to microelectronics through his innovative patents underline the importance of continued research and development in the field. His work not only advances technology but also paves the way for future innovations in semiconductor manufacturing, showcasing the critical role inventors play in shaping the industry.

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