Somik Mukherjee

Title: Somik Mukherjee: Innovator in Semiconductor Technology

Introduction

Somik Mukherjee is a prominent inventor based in Boise, ID (US), known for his contributions to semiconductor technology. He holds two patents that showcase his innovative approaches to semiconductor formation and passivation.

Latest Patents

Somik's latest patents include "Semiconductor formation using hybrid oxidation" and "Semiconductor nitridation passivation." The first patent describes methods, apparatuses, and systems related to forming a semiconductor using hybrid oxidation. An example method includes forming an opening to create an isolation region in a semiconductor substrate. It further details the deposition of a first dielectric into the isolation region at a first oxidation rate, followed by the deposition of a second dielectric at a second oxidation rate. The second patent focuses on methods, apparatuses, and systems related to semiconductor nitridation passivation. This includes performing a dry etch process on a semiconductor structure on a wafer, followed by a dry strip process and two wet strip clean processes. The method culminates in nitridation passivation to prevent oxidation of the semiconductor structure.

Career Highlights

Somik Mukherjee is currently employed at Micron Technology Incorporated, where he applies his expertise in semiconductor fabrication. His work has significantly advanced the field, particularly in the areas of oxidation and passivation techniques.

Collaborations

Some of Somik's notable coworkers include Russell A Benson and Silvia Borsari, who contribute to the innovative environment at Micron Technology.

Conclusion

Somik Mukherjee's work in semiconductor technology exemplifies the spirit of innovation and collaboration in the field. His patents reflect a commitment to advancing semiconductor processes, making significant contributions to the industry.