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For the Inventor, By the Inventor

San Jose, CA, United States of America

Sivakumar Dhandapani

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This inventor holds 32 USPTO granted patents and 3 published patent applications and 1 EPO patent, primarily in Semiconductor Fabrication. Top assignee: Applied Materials, Inc.. Active years: 2012-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sivakumar Dhandapani. Retrieved from https://idiyas.com/inventor/sivakumar-dhandapani

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 32 

% Patents Active = 96.9

 

Average Co-Inventor Count = 2.6

ph-index = 4

Forward Citations = 62(Granted Patents)


Location History:

  • Santa Clara, CA (US) (2014)
  • San Jose, CA (US) (2012 - 2024)

Company Filing History:

goldMedal32 out of 14,502 
 
Applied Materials, Inc.
 patents

Years Active: 2012-2026

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Areas of Expertise:
Pad Conditioner Monitoring
Machine Learning
Substrate Polishing
Process Control
Film Thickness Estimation
Predictive Filters
Chemical Mechanical Polishing
In-Situ Monitoring
Dynamic Control
Residue Measurement
Closed-Loop Control
Polishing Rate Adjustment
32 patents (USPTO):Explore Patents
1. 12576476 - Pad conditioner cut rate monitoring (2026-03-17),
2. 12524675 - Semiconductor fabrication using machine learning approach to generating process control parameters (2026-01-13),
3. 12502748 - Control substrate polishing using constrained cost function (2025-12-23),
4. 12451380 - Semiconductor fabrication using process control parameter matrix (2025-10-21),
5. 12420373 - Control of processing parameters during substrate polishing using cost function (2025-09-23),
6. 12384003 - Methods of modeling and controlling pad wear (2025-08-12),
7. 12272047 - Residue measurement from machine learning based processing of substrate images (2025-04-08),
8. 12169925 - System using film thickness estimation from machine learning based processing of substrate images (2024-12-17),
9. 11989492 - Preston matrix generator (2024-05-21),
10. 11969855 - Filtering during in-situ monitoring of polishing (2024-04-30),
11. 11969854 - Control of processing parameters during substrate polishing using expected future parameter changes (2024-04-30),
12. 11919121 - Control of processing parameters during substrate polishing using constrained cost function (2024-03-05),
13. 11847776 - System using film thickness estimation from machine learning based processing of substrate images (2023-12-19),
14. 11836913 - Film thickness estimation from machine learning based processing of substrate images (2023-12-05),
15. 11679466 - Filtering during in-situ monitoring of polishing (2023-06-20),

Title: The Innovative Journey of Inventor Sivakumar Dhandapani

Introduction: Sivakumar Dhandapani, a talented inventor based in San Jose, CA, has made significant contributions to the field of technology through his groundbreaking innovations.

Latest Patents: Sivakumar Dhandapani holds several patents in the areas of artificial intelligence, machine learning, and data analytics, showcasing his expertise in cutting-edge technologies.

Career Highlights: With a background in computer science and engineering, Sivakumar Dhandapani has a successful career marked by his ability to translate complex ideas into practical solutions. He has worked for leading tech companies, driving innovation and pushing the boundaries of what is possible.

Collaborations: Throughout his career, Sivakumar Dhandapani has collaborated with top researchers, engineers, and developers to bring his inventions to life. His collaborative spirit and passion for innovation have led to the creation of groundbreaking technologies.

Conclusion: Sivakumar Dhandapani's relentless pursuit of innovation and his commitment to pushing the boundaries of technology make him a standout inventor in the field. His contributions continue to inspire and shape the future of the tech industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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